FloTron Multi-channel Plasma Emission Monitoring and Reactive Gas Control
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A resource on Reactive Sputtering for engineers, technologists, managers and anyone interested. Image courtesy of Angstrom Sciences, Inc. Basic Concepts of Reactive Sputtering.
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FloTron Multi-channel Plasma Emission Monitoring and Reactive Gas ControlDESCRIPTION
FloTron main page x3. FloTron X is an extended range 200 - 1040 nm fast spectrometer-based multiple channel process control system for technological plasma-based processes, such as reactive magnetron sputtering. FloT. FloTron H - a hybrid system that combines two optical monitoring technologies, a CCD-based spectrometer input and photomultiplier tube inputs with narrow bandpass filters. FloTron H thus provides. Process control, monitoring, development and optimisation.CONTENT
This site flotron.net states the following, "FloTron X is an extended range 200 - 1040 nm fast spectrometer-based multiple channel process control system for technological plasma-based processes, such as reactive magnetron sputtering." Our analyzers observed that the webpage also said " FloTron H - a hybrid system that combines two optical monitoring technologies, a CCD-based spectrometer input and photomultiplier tube inputs with narrow bandpass filters." The Website also stated " Process control, monitoring, development and optimisation."MORE WEB SITES
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